Advances in Energy Sciences and Technologies

Advances in Energy Sciences and Technologies

Optimization of silicon solar cell performance through RF magnetron sputtered WS₂ thin films: Effect of coating thickness on photovoltaic characteristics

Document Type : Original Article

Authors
1 Physics and Energy Engineering Department, Amirkabir University of Technology (Tehran Polytechnic), P.O. Box 15875-4413, Tehran, Iran
2 Physics Department, Faculty of Science, Imam Khomeini International University, P.O. Box 34149-16818, Qazvin, Iran
10.22060/aest.2026.26208.1012
Abstract
This study investigates the effect of tungsten disulfide (WS₂) thin-film coatings deposited by Radio-frequency (RF) magnetron sputtering on the performance of silicon solar cells. WS₂ layers with thicknesses of 120, 240, 400, and 600 Å were applied, and the photovoltaic characteristics were evaluated through I–V and P–V measurements. The results showed that coating thickness significantly influences cell performance. Efficiency improved for thicknesses between 120 and 400 Å, with the best performance obtained at 400 Å, where the fill factor increased from 0.5 to 0.6 and the conversion efficiency increased from 9.5% to 10.0%. However, a thickness of 600 Å reduced efficiency due to increased optical and electrical losses. The findings indicate that an optimum WS₂ thickness exists and that RF magnetron sputtering is an effective method for enhancing silicon solar cell performance.

Graphical Abstract

Optimization of silicon solar cell performance through RF magnetron sputtered WS₂ thin films: Effect of coating thickness on photovoltaic characteristics
Keywords
Subjects

References
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Volume 2, Issue 1
Summer 2026
Pages 44-51

  • Receive Date 07 July 2026
  • Revise Date 13 August 2026
  • Accept Date 18 August 2026
  • Publish Date 01 July 2026